Imperfection Standards for Optical Surfaces
There are two specification systems in the optical world used for characterizing imperfections on optical surfaces. Often described as surface quality or surface cleanliness. One is the scratch-dig specification based on the US military standard MIL-PRF-13830B and more commonly used in the USA. The other one is the ISO specification, notably the part ISO 10110-7, and more generally used in Europe.
The scratch-dig specification is for visibility specification whereas the ISO is for dimensional specification. This webinar will give an overview of the standards of both specification systems together with associated other standards. These are especially:
US military standard regarding optical components for fire control instruments
- ANSI OEOSC OP1.002
American National Standard for appearance imperfections
- ISO 10110-7
ISO drawing standard for surface imperfections
- ISO 14997
ISO verification standard for test methods for surface imperfections
- ISO/TR 21477
ISO technical report for comparison of visibility (MIL) and dimensional specification (ISO)
A short presentation of measuring tools and standards will also be given.
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The starting time is 5:00 pm (CEST, UTC+2).
After succesful registration and payment we will send you a personalised link to registrate on the edudip-next platform for our Photonics Hub Online Seminar.
The platfrom provides a chat function for questions during the online seminar. A Webcam and microphone also can be used for communication, but isn't necessary to participate.
Our Photonics Hub Online Seminars adress all people, who cannot participate in our residential courses or want to benefit in participating from anywhere by internet.
For people who are starting to work with problems or questions of imperfections on optical surfaces this webinar will provide a summarized overview and give a short introduction in these standards.
Termin und Veranstaltungsort
Dr. Manfred Thomae
Dr. Thomae was formerly at the Leica Microsystems CMS GmbH, Wetzlar, at the Leica Optic Center. Since 2002 he is coworker and project leader in the DIN technical commitee NA027-01-02 and since 2008 in ISO TC 172 SC1, which are developing and editing the standards of ISO 10110.
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